Alternating Bias Assisted Annealing of Amorphous Oxide Tunnel Junctions

  1. David P. Pappas,
  2. Mark Field,
  3. Cameron Kopas,
  4. Joel A. Howard,
  5. Xiqiao Wang,
  6. Ella Lachman,
  7. Lin Zhou,
  8. Jinsu Oh,
  9. Kameshwar Yadavalli,
  10. Eyob A. Sete,
  11. Andrew Bestwick,
  12. Matthew J. Kramer,
  13. and Joshua Y. Mutus
We demonstrate a transformational technique for controllably tuning the electrical properties of fabricated thermally oxidized amorphous aluminum-oxide tunnel junctions. Using conventional
test equipment to apply an alternating bias to a heated tunnel barrier, giant increases in the room temperature resistance, greater than 70%, can be achieved. The rate of resistance change is shown to be strongly temperature-dependent, and is independent of junction size in the sub-micron regime. In order to measure their tunneling properties at mK temperatures, we characterized transmon qubit junctions treated with this alternating-bias assisted annealing (ABAA) technique. The measured frequencies follow the Ambegaokar-Baratoff relation between the shifted resistance and critical current. Further, these studies show a reduction of junction-contributed loss on the order of ≈2×10−6, along with a significant reduction in resonant- and off-resonant-two level system defects when compared to untreated samples. Imaging with high-resolution TEM shows that the barrier is still predominantly amorphous with a more uniform distribution of aluminum coordination across the barrier relative to untreated junctions. This new approach is expected to be widely applicable to a broad range of devices that rely on amorphous aluminum oxide, as well as the many other metal-insulator-metal structures used in modern electronics.

Potential Nanoscale Sources of Decoherence in Niobium based Transmon Qubit Architectures

  1. Akshay A. Murthy,
  2. Paul Masih Das,
  3. Stephanie M. Ribet,
  4. Cameron Kopas,
  5. Jaeyel Lee,
  6. Matthew J. Reagor,
  7. Lin Zhou,
  8. Matthew J. Kramer,
  9. Mark C. Hersam,
  10. Mattia Checchin,
  11. Anna Grassellino,
  12. Roberto dos Reis,
  13. Vinayak P. Dravid,
  14. and Alexander Romanenko
Superconducting thin films of niobium have been extensively employed in transmon qubit architectures. Although these architectures have demonstrated remarkable improvements in recent
years, further improvements in performance through materials engineering will aid in large-scale deployment. Here, we use information retrieved from electron microscopy and analysis to conduct a detailed assessment of potential decoherence sources in transmon qubit test devices. In the niobium thin film, we observe the presence of localized strain at interfaces, which may amplify interactions between two-level systems and impose limits on T1 and T2 relaxation times. Additionally, we observe the presence of a surface oxide with varying stoichiometry and bond distances, which can generate a broad two-level system noise spectrum. Finally, a similarly disordered and rough interface is observed between Nb and the Si substrate. We propose that this interface can also degrade the overall superconducting properties.

TOF-SIMS Analysis of Decoherence Sources in Nb Superconducting Resonators

  1. Akshay A. Murthy,
  2. Jae-Yel Lee,
  3. Cameron Kopas,
  4. Matthew J. Reagor,
  5. Anthony P. McFadden,
  6. David P. Pappas,
  7. Mattia Checchin,
  8. Anna Grassellino,
  9. and Alexander Romanenko
Superconducting qubits have emerged as a potentially foundational platform technology for addressing complex computational problems deemed intractable with classical computing. Despite
recent advances enabling multiqubit designs that exhibit coherence lifetimes on the order of hundreds of μs, material quality and interfacial structures continue to curb device performance. When niobium is deployed as the superconducting material, two-level system defects in the thin film and adjacent dielectric regions introduce stochastic noise and dissipate electromagnetic energy at the cryogenic operating temperatures. In this study, we utilize time-of-flight secondary ion mass spectrometry (TOF-SIMS) to understand the role specific fabrication procedures play in introducing such dissipation mechanisms in these complex systems. We interrogated Nb thin films and transmon qubit structures fabricated by Rigetti Computing and at the National Institute of Standards and Technology through slight variations in the processing and vacuum conditions. We find that when Nb film is sputtered onto the Si substrate, oxide and silicide regions are generated at various interfaces. We also observe that impurity species such as niobium hydrides and carbides are incorporated within the niobium layer during the subsequent lithographic patterning steps. The formation of these resistive compounds likely impact the superconducting properties of the Nb thin film. Additionally, we observe the presence of halogen species distributed throughout the patterned thin films. We conclude by hypothesizing the source of such impurities in these structures in an effort to intelligently fabricate superconducting qubits and extend coherence times moving forward.