In-situ bandaged Josephson junctions for superconducting quantum processors

Shadow evaporation is commonly used to micro-fabricate the key element of superconducting qubits — the Josephson junction. However, in conventional two-angle deposition circuit topology, unwanted stray Josephson junctions are created which contribute to dielectric loss. So far, this could be avoided by shorting the stray junctions with a so-called bandage layer deposited in an additional lithography step. Here, we present an improved shadow evaporation technique allowing one to deposit submicrometer-sized Josephson junctions together with bandage layers in a single lithography step. We also show that junction aging is signficantly reduced when junction electrodes and the bandage layers are oxidized in an oxygen atmosphere directly after deposition.