On-chip stencil lithography for superconducting qubits

Improvements in circuit design and more recently in materials and surface cleaning have contributed to a rapid development of coherent superconducting qubits. However, organic resists

commonly used for shadow evaporation of Josephson junctions (JJs) pose limitations due to residual contamination, poor thermal stability and compatibility under typical surface-cleaning conditions. To provide an alternative, we developed an inorganic SiO2/Si3N4 on-chip stencil lithography mask for JJ fabrication. The stencil mask is resilient to aggressive cleaning agents and it withstands high temperatures up to 1200\textdegree{}C, thereby opening new avenues for JJ material exploration and interface optimization. To validate the concept, we performed shadow evaporation of Al-based transmon qubits followed by stencil mask lift-off using vapor hydrofluoric acid, which selectively etches SiO2. We demonstrate average $T_1 \approx 75 \pm 11~\SI{}{\micro\second}$ over a 200 MHz frequency range in multiple cool-downs for one device, and $T_1 \approx 44\pm 8~\SI{}{\micro\second}$ for a second device. These results confirm the compatibility of stencil lithography with state-of-the-art superconducting quantum devices and motivate further investigations into materials engineering, film deposition and surface cleaning techniques.

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Observation of Josephson Harmonics in Tunnel Junctions

An accurate understanding of the Josephson effect is the keystone of quantum information processing with superconducting hardware. Here we show that the celebrated sinφ current-phase

relation (CφR) of Josephson junctions (JJs) fails to fully describe the energy spectra of transmon artificial atoms across various samples and laboratories. While the microscopic theory of JJs contains higher harmonics in the CφR, these have generally been assumed to give insignificant corrections for tunnel JJs, due to the low transparency of the conduction channels. However, this assumption might not be justified given the disordered nature of the commonly used AlOx tunnel barriers. Indeed, a mesoscopic model of tunneling through an inhomogeneous AlOx barrier predicts contributions from higher Josephson harmonics of several %. By including these in the transmon Hamiltonian, we obtain orders of magnitude better agreement between the computed and measured energy spectra. The measurement of Josephson harmonics in the CφR of standard tunnel junctions prompts a reevaluation of current models for superconducting hardware and it offers a highly sensitive probe towards optimizing tunnel barrier uniformity.

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Integration of selectively grown topological insulator nanoribbons in superconducting quantum circuits

We report on the precise integration of nm-scale topological insulator Josephson junctions into mm-scale superconducting quantum circuits via selective area epitaxy and local stencil

lithography. By studying dielectric losses of superconducting microwave resonators fabricated on top of our selective area growth mask, we verify the compatibility of this in situ technique with microwave applications. We probe the microwave response of on-chip microwave cavities coupled to topological insulator-shunted superconducting qubit devices and observe a power dependence that indicates nonlinear qubit behaviour. Our method enables integration of complex networks of topological insulator nanostructures into superconducting circuits, paving the way for both novel voltage-controlled Josephson and topological qubits.

arxiv pdf