Converting qubit relaxation into erasures with a single fluxonium

  1. Chenlu Liu,
  2. Yulong Li,
  3. Jiahui Wang,
  4. Quan Guan,
  5. Lijing Jin,
  6. Lu Ma,
  7. Ruizi Hu,
  8. Tenghui Wang,
  9. Xing Zhu,
  10. Hai-Feng Yu,
  11. Chunqing Deng,
  12. and Xizheng Ma
Qubits that experience predominantly erasure errors offer distinct advantages for fault-tolerant operation. Indeed, dual-rail encoded erasure qubits in superconducting cavities and
transmons have demonstrated high-fidelity operations by converting physical-qubit relaxation into logical-qubit erasures, but this comes at the cost of increased hardware overhead and circuit complexity. Here, we address these limitations by realizing erasure conversion in a single fluxonium operated at zero flux, where the logical state is encoded in its 0-2 subspace. A single, carefully engineered resonator provides both mid-circuit erasure detection and end-of-line (EOL) logical measurement. Post-selection on non-erasure outcomes results in more than four-fold increase of the logical lifetime, from 193 μs to 869 μs. Finally, we characterize measurement-induced logical dephasing as a function of measurement power and frequency, and infer that each erasure check contributes a negligible error of 7.2×10−5. These results establish integer-fluxonium as a promising, resource-efficient platform for erasure-based error mitigation, without requiring additional hardware.

Integration of selectively grown topological insulator nanoribbons in superconducting quantum circuits

  1. Tobias W. Schmitt,
  2. Malcolm R. Connolly,
  3. Michael Schleenvoigt,
  4. Chenlu Liu,
  5. Oscar Kennedy,
  6. Abdur R. Jalil,
  7. Benjamin Bennemann,
  8. Stefan Trellenkamp,
  9. Florian Lentz,
  10. Elmar Neumann,
  11. Tobias Lindström,
  12. Sebastian E. de Graaf,
  13. Erwin Berenschot,
  14. Niels Tas,
  15. Gregor Mussler,
  16. Karl D. Petersson,
  17. Detlev Grützmacher,
  18. and Peter Schüffelgen
We report on the precise integration of nm-scale topological insulator Josephson junctions into mm-scale superconducting quantum circuits via selective area epitaxy and local stencil
lithography. By studying dielectric losses of superconducting microwave resonators fabricated on top of our selective area growth mask, we verify the compatibility of this in situ technique with microwave applications. We probe the microwave response of on-chip microwave cavities coupled to topological insulator-shunted superconducting qubit devices and observe a power dependence that indicates nonlinear qubit behaviour. Our method enables integration of complex networks of topological insulator nanostructures into superconducting circuits, paving the way for both novel voltage-controlled Josephson and topological qubits.